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http://localhost:8080/xmlui/handle/123456789/3254Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Baruah, Arabinda | - |
| dc.contributor.author | Jha, Menaka | - |
| dc.contributor.author | Kumar, Santosh | - |
| dc.contributor.author | Ganguli, AshokKumar | - |
| dc.date.accessioned | 2025-05-02T09:22:01Z | - |
| dc.date.available | 2025-05-02T09:22:01Z | - |
| dc.date.issued | 2015 | - |
| dc.identifier.citation | 10.1088/2053-1591/2/5/056404 | en_US |
| dc.identifier.uri | http://localhost:8080/xmlui/handle/123456789/3254 | - |
| dc.description | NITW | en_US |
| dc.description.abstract | Fabricationofcontrolledlayeredstructuredthinfilmswithtunablephysicalpropertiesisanimportant areaofresearchasthinfilmtechnologyholdspotentialforavarietyofindustrialapplications.Inthe presentwork,wehavedemonstratedtheprocessforfabricationofmultilayerfilmsofsilicaand tantalumoxidebyLangmuir–Blodgettfilmfabricationtechniqueandinvestigatedtheirphotocatalytic degradationefficiencyfororganicdye(RhodamineB)underUVradiation.Thephotocatalytic degradationofRhBinpresenceofSiO2–Ta2O5exhibitedremarkablyenhancedphotocatalyticactivity thanpureTa2O5.Thisisbecauseofthehighseparationefficiencyofphoto-generatedelectron–hole pair duetotheLewisacidityofsilicaandthegreatercontactareabetweenthesetwolayers.TheSiO2Ta2O5systemwasoptimizedforthenumberofself-assembledlayersofsilicaandtantalumoxide,and it hasbeenfoundthat10S–15T–10S–15T–10S–15T(whereSandTrepresentsSiO2andTa2O5 respectively) pattern hasbeenfoundtohavemaximumphotocatalyticdegradationefficiencyof71% (with18%degradationperunitareaofthefilm)whichis3.5foldhigherthanpureTa2O5under identical experimental condition.Also,thephotocatalyticactivityofthesefilmswasalsoprovedtobe sensitive to thesequenceofsilicaandtantalumoxidelayerswhenthefilmareaofallthesampleswas keptconstant(3.75 cm2).Furtheranalysisconfirmsthatthedegradationofdyemoleculeshasbeen largely promotedbythephotogeneratedholes,ratherthanthesuperoxideradicalanions. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Materials Research Express | en_US |
| dc.subject | Tantalum pentoxide | en_US |
| dc.subject | Silica | en_US |
| dc.title | Enhancement of photocatalytic efficiency using heterostructured SiO2-Ta2O5 thin films | en_US |
| dc.type | Article | en_US |
| Appears in Collections: | Chemistry | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Baruah_2015_Mater._Res._Express_2_056404.pdf | 2.12 MB | Adobe PDF | View/Open |
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