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Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/2446
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dc.contributor.authorPradeepkumar, Maurya Sandeep-
dc.contributor.authorSibin, K.P.-
dc.contributor.authorSwain, Niharika-
dc.contributor.authorSridhara, N.-
dc.contributor.authorDey, Arjun-
dc.contributor.authorBarshilia, Harish C.-
dc.contributor.authorSharma, Anand Kumar-
dc.date.accessioned2025-01-06T08:45:31Z-
dc.date.available2025-01-06T08:45:31Z-
dc.date.issued2015-
dc.identifier.citation10.1016/j.ceramint.2015.02.090en_US
dc.identifier.urihttp://localhost:8080/xmlui/handle/123456789/2446-
dc.descriptionNITWen_US
dc.description.abstractWe report nanoindentation response of indium tin oxide (ITO) film deposited by reactive direct current (DC) magnetron sputtering. The phase pure ITO film showed dense and needle-like nanostructure. Detailed mechanical characterization of ITO film was carried out by the nanoindentation technique. The average nanohardness and elastic modulus were evaluated as about 17.5 GPa and 189 GPa, respectively. Comparatively higher nanohardness and modulus values were found in the present work, which is possibly linked with the dense nanostructure of the ITO film. Further, fracture toughness was measured as 0.56 MPa m0.5. The corresponding projected area of indentation, elastic energy and plastic energy were also reported.en_US
dc.language.isoenen_US
dc.publisherCeramics Internationalen_US
dc.subjectIndium tin oxideen_US
dc.subjectNanohardnessen_US
dc.titleNanoindentation response of ITO filmen_US
dc.typeArticleen_US
Appears in Collections:Metallurgical and Materials Engineering

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